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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">alternative</journal-id><journal-title-group><journal-title xml:lang="ru">Альтернативная энергетика и экология (ISJAEE)</journal-title><trans-title-group xml:lang="en"><trans-title>Alternative Energy and Ecology (ISJAEE)</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1608-8298</issn><publisher><publisher-name>Международный издательский дом научной периодики "Спейс</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.15518/isjaee.2017.10-12.094-103</article-id><article-id custom-type="elpub" pub-id-type="custom">alternative-1026</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ИННОВАЦИОННЫЕ  РЕШЕНИЯ , ТЕХНОЛОГИИ, УCТРОЙСТВА И ИХ ВНЕДРЕНИЕ</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>INNOVATIONSOLUTIONS, TECHNOLOGIES , FACILITIES AND THEIR INNOVATION</subject></subj-group></article-categories><title-group><article-title>ИССЛЕДОВАНИЕ ВОЗМОЖНОСТИ ИСПОЛЬЗОВАНИЯ РЕАКТОРОВ ПЛАЗМОХИМИЧЕСКОГО ОСАЖДЕНИЯ ИЗ ГАЗОВОЙ ФАЗЫ 5-ГО ПОКОЛЕНИЯ (GEN5 PECVD) ДЛЯ ПРОИЗВОДСТВА ВЫСОКОЭФФЕКТИВНЫХ ГЕТЕРОПЕРЕХОДНЫХ КРЕМНИЕВЫХ СОЛНЕЧНЫХ ЯЧЕЕК</article-title><trans-title-group xml:lang="en"><trans-title>STUDY ON THE USE OF GEN5 PECVD REACTORS FOR PRODUCTION OF HIGH-EFFICIENCY SILICON HETEROJUNCTION SOLAR CELLS</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Аболмасов</surname><given-names>С.</given-names></name><name name-style="western" xml:lang="en"><surname>Abolmasov</surname><given-names>S.</given-names></name></name-alternatives><email xlink:type="simple">e.terukov@hevelsolar.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Абрамов</surname><given-names>А.</given-names></name><name name-style="western" xml:lang="en"><surname>Abramov</surname><given-names>A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>канд. физ.-мат. наук, руководитель отдела по солнечной энергетике ООО «НТЦ ТПТ», старший научный сотрудник ФТИ им. А.Ф. Иоффе.</p></bio><bio xml:lang="en"><p>Ph.D. (physics and mathematics), Head of Photovoltaics Department at TFTE LLC, Senior Researcher at A.F. Ioffe Physical-Technical Institute</p></bio><email xlink:type="simple">e.terukov@hevelsolar.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Андроников</surname><given-names>Д.</given-names></name><name name-style="western" xml:lang="en"><surname>Andronikov</surname><given-names>D.</given-names></name></name-alternatives><bio xml:lang="ru"><p>канд. физ.-мат. наук, главный технолог ООО «НТЦ ТПТ», научный сотрудник ФТИ им. А.Ф. Иоффе.</p></bio><bio xml:lang="en"><p>Ph.D. (physics and mathematics), Chief Process Engineer at TFTE LLC, Research Scientist at A.F. Ioffe Institute</p></bio><email xlink:type="simple">e.terukov@hevelsolar.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Емцев</surname><given-names>К.</given-names></name><name name-style="western" xml:lang="en"><surname>Emtsev</surname><given-names>K.</given-names></name></name-alternatives><email xlink:type="simple">e.terukov@hevelsolar.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Иванов</surname><given-names>Г.</given-names></name><name name-style="western" xml:lang="en"><surname>Ivanov</surname><given-names>G.</given-names></name></name-alternatives><email xlink:type="simple">e.terukov@hevelsolar.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Няпшаев</surname><given-names>И.</given-names></name><name name-style="western" xml:lang="en"><surname>Nyapshaev</surname><given-names>I.</given-names></name></name-alternatives><email xlink:type="simple">e.terukov@hevelsolar.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Орехов</surname><given-names>Д.</given-names></name><name name-style="western" xml:lang="en"><surname>Orekhov</surname><given-names>D.</given-names></name></name-alternatives><bio xml:lang="ru"><p>канд. техн. наук, генеральный директор</p></bio><bio xml:lang="en"><p>Ph.D. (engineering), TFTE LLC, CEO</p></bio><email xlink:type="simple">e.terukov@hevelsolar.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Семенов</surname><given-names>А.</given-names></name><name name-style="western" xml:lang="en"><surname>Semenov</surname><given-names>A.</given-names></name></name-alternatives><email xlink:type="simple">e.terukov@hevelsolar.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Теруков</surname><given-names>Е.</given-names></name><name name-style="western" xml:lang="en"><surname>Terukov</surname><given-names>E.</given-names></name></name-alternatives><bio xml:lang="ru"><p>д-р техн. наук, зам. генерального директора по научной работе</p></bio><bio xml:lang="en"><p>D.Sc. (engineering), Professor, Deputy Director for science of TF TE R&amp;D Center LLC</p></bio><email xlink:type="simple">e.terukov@hevelsolar.com</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Титов</surname><given-names>А.</given-names></name><name name-style="western" xml:lang="en"><surname>Titov</surname><given-names>A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>аспирант ФТИ Иоффе РАН, сотрудник ООО НТЦ ТПТ</p></bio><bio xml:lang="en"><p>Postgraduate Student at the Ioffe Institute, works at R&amp;D TFTE LLC</p></bio><email xlink:type="simple">e.terukov@hevelsolar.com</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Шахрай</surname><given-names>И.</given-names></name><name name-style="western" xml:lang="en"><surname>Shakhrai</surname><given-names>I.</given-names></name></name-alternatives><email xlink:type="simple">e.terukov@hevelsolar.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Шелопин</surname><given-names>Г.</given-names></name><name name-style="western" xml:lang="en"><surname>Shelopin</surname><given-names>G.</given-names></name></name-alternatives><email xlink:type="simple">e.terukov@hevelsolar.com</email><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>НТЦ тонкопленочных технологий в энергетике</institution><country>Россия</country></aff><aff xml:lang="en"><institution>R&amp;D Center of Thin Film Technologies in Energetics</institution><country>Russian Federation</country></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>НТЦ тонкопленочных технологий в энергетике&#13;
Физико-технический институт им. А.Ф. Иоффе РАН</institution><country>Russian Federation</country></aff><aff xml:lang="en"><institution>R&amp;D Center of Thin Film Technologies in Energetics&#13;
The Ioffe Institute</institution><country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2017</year></pub-date><pub-date pub-type="epub"><day>17</day><month>05</month><year>2017</year></pub-date><volume>0</volume><issue>10-12</issue><fpage>94</fpage><lpage>103</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Международный издательский дом научной периодики "Спейс, 2017</copyright-statement><copyright-year>2017</copyright-year><copyright-holder xml:lang="ru">Международный издательский дом научной периодики "Спейс</copyright-holder><copyright-holder xml:lang="en">Международный издательский дом научной периодики "Спейс</copyright-holder><license xlink:href="https://www.isjaee.com/jour/about/submissions#copyrightNotice" xlink:type="simple"><license-p>https://www.isjaee.com/jour/about/submissions#copyrightNotice</license-p></license></permissions><self-uri xlink:href="https://www.isjaee.com/jour/article/view/1026">https://www.isjaee.com/jour/article/view/1026</self-uri><abstract><p>В рамках работы производится оценка потенциала использования реакторов плазмохимического осаждения из газовой фазы 5-го поколения (Gen5 (1.4 m2) KAI PECVD), которые изначально разрабатывались в целях создания двухкаскадных тонкопленочных кремниевых (микроморфных) модулей, для производства высокоэффективных гетероструктурных кремниевых (Si-HJ) солнечных ячеек. Показано, что данные реакторы могут обеспечивать отличную равномерность как оптических, так и электрических свойств слоёв гидрогенизированного аморфного кремния по всей поверхности подложкодержателя, размеры которой составляют 110 130 см2. На кремниевых подложках n-типа, изготовленных методом зонной плавки (n-type FZ c-Si), достигается пассивация поверхности с низкой скоростью поверхностной рекомбинации (&lt;4 см/с). Первая часть работы проводилась на пилотной линии ООО «НТЦ ТПТ» (ФТИ им. Иоффе, Россия, Санкт-Петербург), где &gt;были получены гетероструктурные кремниевые солнечные ячейки со средней эффективностью, составляю-щей более 21,5 %. В дальнейшем данные результаты были перенесены на производственную линию завода ООО «Хевел» (Россия, Чебоксары), где при использовании коммерческих 6-дюймовых CZ c-Si подложек и плазмохимических реакторов Gen5 KAI PECVD также были получены Si-HJ солнечные ячейки со средней эффективностью более 21,5 %. Показано, что данные реакторы потенциально могут быть успешно применены для производства солнечных ячеек с эффективностью преобразования более 22 %. Из полученных высокоэффективных гетероструктурных кремниевых солнечных ячеек были собраны солнечные модули. Продемонстрирован потенциал для получения солнечных модулей с вырабатываемой мощностью более 300 Ватт.</p><sec><title> </title><p> </p></sec><sec><title> </title><p> </p></sec></abstract><trans-abstract xml:lang="en"><p>In this study, we evaluate the potential of using Gen5 (1.4 m2 ) KAI PECVD reactors, originally designed for production of double-junction thin film silicon (micromorph) modules, for manufacturing of high-efficiency silicon heterojunction (Si-HJ) solar cells. It is shown that Gen5 KAI PECVD reactors can provide an excellent uniformity of optical and electrical properties of hydrogenated amorphous silicon layers across entire surface of a 110 130 cm2 wafer carrier. Surface passivation with low surface recombination velocity (&lt; 4 cm/s) is achieved on n-type FZ c-Si wafers. First part of the study was conducted on the pilot line at the R&amp;D Center TFTE LLC (Ioffe Institute, St. Petersburg, Russia), where Si-HJ solar cells, with a mean efficiency over 21,5%, were made. Further, these results were transferred on the production line of the Hevel LLC factory, where cells with mean efficiency over 21,5% are produced using commercial 6-inch n-type CZ c-Si wafers and Gen5 KAI PECVD reactors. The potential to reach the efficiency above 22% and solar panels with output power over 300 Watt is also demonstrated.</p><p> </p></trans-abstract><kwd-group xml:lang="ru"><kwd>высокоэффективные гетероструктурные кремниевые солнечные ячейки</kwd><kwd>реакторы плазмохимического осаждения из газовой фазы 5-го поколения</kwd><kwd>слои гидрогенизированного аморфного кремния</kwd></kwd-group><kwd-group xml:lang="en"><kwd>SI-HJ solar cells</kwd><kwd>Gen5 KAI PECVD reactors</kwd><kwd>hydrogenated amorphous silicon layers</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Das, U.K. Surface passivation and heterojunction cells on Si (100) and (111) wafers using dc and rf plasma deposited Si: H thin films / U.K. Das [et al.] // Applied Physics Letters. – 2008. – Vol. 92. – P. 063504.</mixed-citation><mixed-citation xml:lang="en">Das U.K., Burrows M.Z., Lu M., Bowden S., Birkmire R.W. 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